Includes bibliographical references.
|Statement||W. Kaminsky (ed.).|
|Contributions||Kaminsky, W. 1941-|
|LC Classifications||QD411 .M494 1999|
|The Physical Object|
|Pagination||xiii, 674 p. :|
|Number of Pages||674|
|LC Control Number||99025652|
PDF | On Jan 1, , and others published , , Synthesis properties and applications of polyacetylene and polyacetylene based. This chapter reviews recent development of cationic α-diimine nickel(II) and palladium(II) complexes for olefin polymerization. The contributions of ligand structure to the catalytic polymerization Cited by: Ternary metallocene based catalysts in high temperature, high pressure polymerization. In: Metalorganic catalysts for synthesis and polymerization: Recent results by . Chemical vapor deposition. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.